| 摘要 |
PURPOSE: Method of attaching layer material and forming layer in predetermined pattern on substrate using mask are provided to achieve a method of attaching a layer material, such as an emissive material, onto a predetermined position of a substrate with a high precision to form a layer in a desired pattern without generating a scar with a mask and the like. CONSTITUTION: A method of forming an individually patterned layer in a plurality of regions of a substrate, comprises the steps of disposing, between the substrate and a layer material source, a mask(100) including an opening corresponding to one or more of the plurality of regions where the layer is formed, and causing relative movement between the mask and the layer material source, and the substrate, and causing a material scattered from the layer material source to attach to the substrate through the opening, thereby forming the individually patterned layer.
|
