发明名称 |
Light-emitting diode includes conductive layer covering sidewalls and bottom surface of insulating substrate |
摘要 |
A light-emitting diode includes a conductive layer coated to cover the sidewalls and the bottom surface of an insulating substrate and to ohmically contact with a first GaN-based semiconductor layer. A light-emitting diode comprises a laminated semiconductor structure having a first gallium nitride (GaN)-based semiconductor layer (402) formed on top of an insulating substrate (401). An active layer is formed over the first GaN-based semiconductor layer for generating light, and a second GaN-based semiconductor layer is formed over the active layer. An annular isolation portion is formed to separate the second GaN-based semiconductor layer into a central second GaN-based semiconductor layer (406a) and a peripheral second GaN-based semiconductor layer (406b), and to separate the active layer into a central active layer (404a) and a peripheral active layer (404b). A first electrode (409) is formed on the central second GaN-based semiconductor layer without electrically connecting to the peripheral second GaN-based semiconductor layer. A conductive layer (411) is coated to cover the sidewalls and the bottom surface (400b) of the substrate and to ohmically contact with the first GaN-based semiconductor layer. An Independent claim is also included for a method of manufacturing the light-emitting diode.
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申请公布号 |
DE10045149(A1) |
申请公布日期 |
2002.04.04 |
申请号 |
DE2000145149 |
申请日期 |
2000.09.13 |
申请人 |
HIGHLINK TECHNOLOGY CORPORATION, CHUPEI |
发明人 |
LIN, MING-DER |
分类号 |
H01L33/20;H01L33/32;H01L33/40;H01L33/46;(IPC1-7):H01L33/00 |
主分类号 |
H01L33/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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