METHOD FOR FORMING PATTERN, METHOD FOR MANUFACTURING THIN FILM TRANSISTOR MATRIX SUBSTRATE, AND EXPOSURE MASK

摘要

PURPOSE: A patterning method and a method of forming a TFT matrix substrate are provided to form a desired preferable pattern without any reduction of the pattern at a boundary where a group of patterns formed using a plurality of exposure masks are joined. CONSTITUTION: When a third region sandwiched by a first region exposed with a first exposure mask and a second region exposed with a second exposure mask is exposed with the first and second exposure masks in a complementary manner, repetitive unit patterns for exposing the third region are different from the first patterns.