发明名称 |
Solvent blend for use in high purity precursor removal |
摘要 |
<p>The present invention is a process for cleaning a manifold which delivers high purity source chemical from a high purity source chemical container to a point of use after delivery of the high purity source chemical through the manifold is discontinued, comprising; evacuating the manifold by connection to a source of vacuum, terminating the evacuation, introducing at least one solvent for the high purity source chemical into the manifold from at least one source of the at least one solvent, dissolving any residual high purity source chemical in the manifold into the at least one solvent, venting a resulting mixture of residual high purity source chemical and solvent from the manifold, purging such as by pressurizing the manifold by connection to a source of preferably elevated pressure inert gas and terminating the purging i.e. pressurizing, before reintroducing high purity source chemical into the manifold.</p> |
申请公布号 |
EP1193309(A1) |
申请公布日期 |
2002.04.03 |
申请号 |
EP20010122661 |
申请日期 |
2001.09.28 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
ZORICH, ROBERT SAM;LEI, XINJIAN;SILVA, DAVID JAMES;TRENT, CYNTHIA LEE |
分类号 |
B08B9/027;B08B3/08;B08B9/00;B08B9/02;C11D7/24;C11D7/50;C11D11/00;H01L21/205;H01L21/306;(IPC1-7):C11D7/50 |
主分类号 |
B08B9/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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