发明名称 |
Programmable flux gradient apparatus for co-deposition of materials onto a substrate |
摘要 |
An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second target material source that directs a second material towards the substrate. The apparatus further comprises a gradient shutter system that blocks a first predetermined amount of the first target material and a second predetermined amount of the second target material directed towards the substrate in order to generate gradients of the first and second target materials on the substrate. The gradients of the first and second target materials being simultaneously deposited onto the substrate to form a homogenous resulting material. A method for simultaneously depositing gradients of two or more target material onto a substrate is also disclosed.
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申请公布号 |
US6364956(B1) |
申请公布日期 |
2002.04.02 |
申请号 |
US19990237502 |
申请日期 |
1999.01.26 |
申请人 |
SYMYX TECHNOLOGIES, INC. |
发明人 |
WANG YOUQI;WU XIN DI |
分类号 |
B01J19/00;B01J19/12;C23C14/02;C23C14/06;C23C14/34;C40B40/18;C40B60/14;(IPC1-7):C23C16/00 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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