Methods and apparatus for measurement and correction of optical aberration

摘要

The invention relates to methods and apparatus for determining a characteristic of an optical element. The apparatus includes a spatial light pattern generator adapted to generate a beam of light at a predetermined spatial position, at least one lenslet disposed in an array of lenslets adapted to receive the beam of light from the spatial light pattern generator, and to direct the beam of light to the optical element. The apparatus further includes a detector positioned to receive the beam of light subsequent to the beam of light encountering the optical element. The detector is adapted to detect a received spatial position at which the detector receives the beam of light. The apparatus also includes a processor adapted to compare the predetermined spatial position with the received spatial position to determine the characteristic of the optical element. The invention further relates to methods and apparatus for generating a diffraction limited image. The apparatus includes a spatial light pattern generator adapted to generate a plurality of beams of light at selected spatial positions to compensate for a characteristic of an optical element and an array of lenslets adapted to receive the plurality of beams of light from the spatial light pattern generator and to direct the plurality of beams of light to the optical element. The apparatus also includes an image plane positioned to receive the plurality of beams of light subsequent to the plurality of beams of light encountering the optical element and adapted to form the diffraction limited image.