| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a metal oxide film with superior mechanical strength at a low cost without degrading a photoconductive function, and the metal oxide film manufactured therewith. SOLUTION: A square substrate made of aluminum (1) is degreased with a normal organic solvent, and then subjected to a film formation process. This method includes introducing argon gas into a plasma generating part in an open air atmosphere, igniting plasma, heating the substrate made of aluminum (1) with a heater provided on the bottom, introducing a titanium oxide particle from an introducing aperture of titanium oxide as a raw material, melting a surface layer of the titanium oxide particle in a high temperature plasma, forming a titanium oxide layer (3) by supplying the titanium oxide particle on the substrate made of aluminum (1), and forming a photosensitive layer by controlling an electric power for charging RF plasma and a flow rate of argon gas. A photoelectric conversion characteristic at a wavelength of 380 nm is evaluated in the present embodiment to show an adequate photoconductive characteristic.
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