发明名称 Method and apparatus for arc plasma deposition with evaporation of reagents
摘要 A method and apparatus for depositing a coating on a substrate. A method of coating a substrate comprises evaporating a first reactant; introducing the evaporated reactant into a plasma; and depositing the first reactant on a surface of the substrate. This method may be used to deposit an electrically conductive, ultraviolet filter coating at high rate on a glass or polycarbonate substrate, for example. An apparatus for depositing a UV filter coating on a polymeric substrate comprises a plasma generator having an anode and a cathode to form a plasma, and a first inlet for introducing a first reactant into the plasma, the first reactant comprising an evaporated material that is deposited on the substrate by the plasma. Optionally, a nozzle can be utilized to provide a controlled delivery of the first reactant into the plasma.
申请公布号 US6365016(B1) 申请公布日期 2002.04.02
申请号 US19990271655 申请日期 1999.03.17
申请人 GENERAL ELECTRIC COMPANY 发明人 IACOVANGELO CHARLES DOMINIC;BORST KEITH MILTON;JERABEK ELIHU CALVIN;MARZANO PATRICK PETER;YANG BARRY LEE-MEAN
分类号 B60J1/00;C23C14/08;C23C14/32;C23C16/513;H01J37/32;(IPC1-7):C23C14/08;C23C14/30 主分类号 B60J1/00
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