发明名称 MOLD AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a long-lived and strong mold which is almost free from such defects as the omission of a stamped pattern and an excess pattern and is capable of producing the highly precise dimensions of a configuration such as the lineal width of the stamped pattern and the depth of the stamping, in the mold used for injection-molding glass or plastic lens or diffraction grating or the like. SOLUTION: This mold is characterized in that above all, a pattern layer formed on the surface layer of the mold is made up of silicon nitride(SiN). In addition, the pattern dimensions of the SiN metallic film can be manufactured with high precision by employing a method for stamping a pattern on the SiN film formed on the surface layer of the mold with the help of a mask, of a Cr film applied on the SiN film, which is obtained by working the Cr film into a specified pattern. Thus the mold with a high pattern dimensional precision is obtained.
申请公布号 JP2002096333(A) 申请公布日期 2002.04.02
申请号 JP20000287964 申请日期 2000.09.22
申请人 NTT ADVANCED TECHNOLOGY CORP 发明人 OKADA IKUO;YOSHIHARA HIDEO
分类号 B29C33/38;C03B11/08;C03B19/00;C23C16/34;(IPC1-7):B29C33/38 主分类号 B29C33/38
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