| 摘要 |
There is disclosed an X-ray mask comprising, on a support substrate 11a, an X-ray transmission film 12 for transmitting X-rays and an X-ray absorber pattern 13a formed on the X-ray transmission film 12 for absorbing the X-rays. The X-ray absorber pattern 13a is formed of a material which contains tantalum, boron, nitrogen and/or oxygen. |
