发明名称 Process for spin-on coating with an organic material having a low dielectric constant
摘要 A process for spin-on coating with an organic material having a low dielectric constant, which is suitable for a substrate. A dielectric base layer capable of protecting metal is formed on the substrate, an adhesive promoter layer is formed on the dielectric base layer, and the adhesive promoter layer is baked. A solvent is then used to clean the substrate and simultaneously to dissolve a part of the adhesive promoter layer in order to flatten the adhesive promoter layer. Afterwards, a layer of an organic material with a low dielectric constant is spin-on coated on the adhesive promoter layer, and the layer of an organic material with a low dielectric constant is baked and cured.
申请公布号 US6365228(B1) 申请公布日期 2002.04.02
申请号 US20000685430 申请日期 2000.10.10
申请人 UNITED MICROELECTRONICS CORP. 发明人 TSAI CHENG-YUAN;YANG MING-SHENG;LIN CHIN-HSIANG
分类号 H01L21/312;H01L21/316;(IPC1-7):B05D3/12 主分类号 H01L21/312
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