发明名称 METHOD FOR TREATING PROCESSING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for treating processing equipment, in which time necessary for a rise process is shortened and shortage of life of a device and parts such as a valve is controlled. SOLUTION: In a rise process 1 of a device having at least initial treatment 2 of a robot, treatment 3 of exhaust gas of a chamber and treatment 4 of both temperature rise of a heater and degassing, after each treatment 2-4 is completed, a flag 10 of treatment completion is set up. Thereafter, when an obstacle is generated while the device is operated, treatment of each treatment 2-4, in which the obstacle is generated, is completed and setting of the flag 10 is off. After removing the cause generating the obstacle, when the rise process 1 is executed again, each treatment 2-4, in which the flag 10 of treatment completion is not set up, is automatically executed and each treatment 2-4, in which the flag 10 of treatment completion is set up, is not automatically executed.
申请公布号 JP2002095961(A) 申请公布日期 2002.04.02
申请号 JP20000293324 申请日期 2000.09.27
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 AKAO NORINOBU
分类号 B01J19/00;G05B15/02;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):B01J19/00;H01L21/306 主分类号 B01J19/00
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