| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical vapor deposition(CVD)-SiC film which is not peeled from a substrate and is produced at a low cost, and provide a method for producing the same. SOLUTION: In this producing method, a CVD-SiC film-coated member has a SiC-Si impregnated substrate 2 and a SiC film 5 which is formed on the substrate 2 at a temperature higher than the melting point of silicon by using a CVD process. The SiC film adheres securely to SiC particles 6 in the SiC-Si impregnated substrate 2, but does not adhere to the silicon 3 with which the substrate is impregnated.
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