发明名称 Solution processing apparatus
摘要 Discharge ports of a supply nozzle are structured to be able to discharge a processing solution in a horizontal direction, and a guide plate for reducing the discharge pressure of the processing solution and guiding the processing solution to an under substrate is provided at a position facing the discharge ports. Thus, the appearance of micro bubbles at the time of the supply of the processing solution to the surface of the substrate can be inhibited, thereby reducing poor developing.
申请公布号 US6364547(B1) 申请公布日期 2002.04.02
申请号 US20000694198 申请日期 2000.10.23
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUYAMA YUJI;NAGAMINE SHUICHI
分类号 G03D3/02;(IPC1-7):G03D3/02;G03D5/00 主分类号 G03D3/02
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