| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a supercritical water reaction apparatus which makes treatment stability higher when organic matters, more preferably PCBs are subjected to supercritical water oxidation treatment. SOLUTION: The supercritical water reaction apparatus 10 has a post- treatment device 36 of supercritical water reaction on the downstream of a gas-liquid separator 20. The post-treatment device 36 has an adsorbing means 42 and 44 which adsorb the PCBs in the gaseous component and liquid component separated by the gas-liquid separator 20, organic solvent supplying means 46 and 48 which supply organic solvents to the adsorbers, a waste organic solvent feeding means 50 and 52 which feed the waste organic solvents flowing out of the adsorbers into a reactor 12 and a sequence controller 54 for the adsorbers. The sequence controller performs sequence control by controlling the automatic stop valves around the adsorbers 42 and 44 in such a manner that either of the respective adsorbers 42 and 44 is maintained at the adsorption process step and the other is maintained at the desorption process step during the operation of the supercritical water reaction apparatus.</p> |
