发明名称 VAPOR DEPOSITION METHOD OF METAL THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a method for controlling a film thickness and a composition by preparing vaporizing material with a predetermined composition and quantity and vaporizing the all quantity, in a thin film forming process with an electron beam heating method. SOLUTION: This method comprises putting a high melting point metal mainly consisting of powders in a hearth liner of an electron beam heating apparatus, together with a pure metal or a metallic alloy of the predetermined composition of the vaporizing material, of which the quantity is adjusted so as to correspond to an aimed film thickness, evaporating only the metal of the vaporizing material with heat, and obtaining a coating with the predetermined film thickness and the composition while preventing deterioration of the hearth liner by the remained high melting point metal in the hearth liner.
申请公布号 JP2002097568(A) 申请公布日期 2002.04.02
申请号 JP20000287931 申请日期 2000.09.22
申请人 NITSUTOUSHIYA:KK 发明人 TANAKA NOBUHIRO
分类号 C23C14/24;C23C14/30;(IPC1-7):C23C14/24 主分类号 C23C14/24
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