发明名称 DEVICE FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a treating device for preventing the carrying velocity from being fluctuated when a substrate is carried in/away from a treating part. SOLUTION: This treating device has a carrying mechanism 11 for carrying the substrate 1 and the brush treating parts 28, 29 for subjecting the substrate carried by the mechanism 11 to the prescribed treatment. The mechanism 11 has a lower carrying roller 14 to be brought into contact with the undersurface of the substrate and an upper carrying roller 18 which is disposed at the position opposite to the roller 14 and brought into contact with the top surface of the substrate over the whole length of the width direction for interposing/carrying the substrate in cooperation with the roller 14.
申请公布号 JP2002096038(A) 申请公布日期 2002.04.02
申请号 JP20000291047 申请日期 2000.09.25
申请人 SHIBAURA MECHATRONICS CORP 发明人 YAMAZAKI TAKAHIRO;HARA AKIRA
分类号 B08B7/04;B65G13/00;B65G49/06;B65G49/07;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):B08B7/04 主分类号 B08B7/04
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