| 摘要 |
PURPOSE: A method for producing electroluminescent element is provided to realize the high luminous efficiency, the high light takeout efficiency, the simplicity of the production process, and the formation of highly fine patterns. CONSTITUTION: The first patterned electrode layer(12) and buffer layer(13) are formed on substrate(11). A positive resist is applied wholly on the first luminous layer(14) to form positive resist layer(15) which the positive layer is then subjected to the pattern exposure of ultraviolet(17) with the use of photomask(16) so as not to expose the part that will form the first luminous layer(14). The exposed part of positive resist layer(15) is developed with a developing solution and washed with water to remove positive resist layer(15) on the exposed part. By being developed with a developing solution for a luminous layer, only the first luminous layer(14) on the part not covered with positive resist layer(15) is removed, remaining positive resist layer(15) and the first luminous layer(14) covered with the layer(15). Paint for forming the second luminous layer is applied wholly on these by the use of a spin coating method and the like. Positive resist layer(15) is formed on the whole surface, and photomask(16) is arranged so as to mask parts where the first and the second luminous layer are formed, and then the surface is exposed with ultraviolet(17). By being developed with the second luminous layer developing solution, only the second luminous layer(18) on the part where positive resist layer(15) has not been remained is removed, and only the part covered with positive resist layer(15) is remained.
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