发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve the quality and yield of the product manufactured by a semiconductor manufacturing apparatus by preventing substrates to be treated from being contaminated with organic matters which exist in the apparatus. SOLUTION: In the semiconductor manufacturing device in the enclosure 1, of which clean air flows A and B are formed, a member containing the organic matters is housed in a housing box 26, and the air inside the box 26 is discharged from the box 26 to the outside via an exhaust duct 31.
申请公布号 JP2002093878(A) 申请公布日期 2002.03.29
申请号 JP20000276275 申请日期 2000.09.12
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 TANIYAMA TOMOSHI;HAYASHI AKINARI;NOGAMI KATSUAKI
分类号 B65G49/00;H01L21/02;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65G49/00
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