发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To improve the quality and yield of the product manufactured by a semiconductor manufacturing apparatus by preventing substrates to be treated from being contaminated with organic matters which exist in the apparatus. SOLUTION: In the semiconductor manufacturing device in the enclosure 1, of which clean air flows A and B are formed, a member containing the organic matters is housed in a housing box 26, and the air inside the box 26 is discharged from the box 26 to the outside via an exhaust duct 31. |
申请公布号 |
JP2002093878(A) |
申请公布日期 |
2002.03.29 |
申请号 |
JP20000276275 |
申请日期 |
2000.09.12 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
TANIYAMA TOMOSHI;HAYASHI AKINARI;NOGAMI KATSUAKI |
分类号 |
B65G49/00;H01L21/02;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
B65G49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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