| 摘要 |
PURPOSE: Provided are a photosensitive polymer with a protecting group containing fused aromatic ring and the resist composition containing the same polymer. The photosensitive polymer has a protecting group of the following formula (a) bonded to the backbone of the polymer which is easily hydrolyzed by acid. The above fused aromatic ring bonded to the polymer has strong resistance to dry etching and the resist composition shows big difference of solubility in the alkali developing solution between the part of light exposed and the non-exposed, enhancing the increase of the contrast in the resist layer. The above fused aromatic ring has also the property of absorbing UV light making the composition to be suitable for KrF or ArF resist material in the wave length used in patterning a resist layer. And the resist composition with the above fused aromatic ring with strong absorption in a certain energy wave length is used as a material for bottom anti-reflective layer (BARL), enabling it to be used as BARL material in the future ArF lithography. CONSTITUTION: The photosensitive polymer comprises a polymer with the various protection groups, 0.5-10wt.% (based on the above polymer) of photoacid generator (PAG) such as triarylsulfonium salts, diaryliodonium salts, sulfonates and their mixtures and 0.5-50wt.% (based on PAG) organic salts such as triethanolamine, triisobutylamine, triisooctylamine, triisodecylamine and their mixtures. The above various polymers are a polymer of 3,000-200,000 average molecular weight consisting polymer backbone and the protecting group of the formula (a), where R1 is hydrogen atom or C1-C4 alkyl, X is hydrogen atom, halogen, alkyl or alkoxy group, y is an integer of 1-3, when y is more than 2, the above aromatic ring is linear or branching rings; a polymer of 3,000-50,000 average molecular weight represented by formula 1 where Z is hydrogen atom or methyl, m/(m+n) is 0.05-0.4 and other similar backbone polymers of the same average molecular weight represented by formula 2 and 3 and a polymer of 3,000-50,000 average molecular weight represented by formula 4 where Z is hydrogen atom or methyl, m/(m+n) is 0.5-0.7 and n/(m+n) is 0.3-0.5.
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