发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a power MOSFET for an amplifier device which is satisfactory in output power characteristics and high-frequency characteristics. SOLUTION: Related to the power MOSFET, a shield conductive film 10 of the same electric potential as a source is provided at the upper part of an n-type semiconductor region (drain/offset layer) 8. The shield conductive film 10 and other electrode wirings are arranged in the following order; a drain electrode 15, the shield conductive film 10, a gate electrode 3, a source electrode 13, and a gate-shorting wiring 14. The shield conductive film 10 is formed thinner than the gate electrode 3.
申请公布号 JP2002094054(A) 申请公布日期 2002.03.29
申请号 JP20000283168 申请日期 2000.09.19
申请人 HITACHI LTD 发明人 MORIKAWA MASATOSHI;SHINTO MIO;YOSHIDA ISAO;NAKURA KENICHI
分类号 H01L29/41;H01L21/336;H01L21/8234;H01L27/088;H01L29/06;H01L29/10;H01L29/40;H01L29/423;H01L29/78;H03F1/56;H03F3/193;(IPC1-7):H01L29/78;H01L21/823 主分类号 H01L29/41
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