| 摘要 |
PROBLEM TO BE SOLVED: To provide a metallic material member with improved anchor effect to deposition silicon and improved corrosion resistance against a halogen etching gas, and to provide a film-forming device with high productivity using the member. SOLUTION: The metal material member, that has improved anchor effects on the deposition silicon and corrosion resistance to the halogen etching gas, by machining the surface of a metal material to appropriate surface roughness, and the film-forming device is composed by selecting an optimum material according to the temperature environment of the film-forming device. More specifically, Austenitis stainless steel, where surface up/down addition treatment, where a value defined by a surface volume increate rate exceeds 1.1 and is equal to or less than 4 is made to the surface of the metal material, is made, pure nickel, a nickel alloy, pure aluminum, an aluminum alloy can be used. By using these materials for appropriate locations according to an environmental temperature, the film-forming device can be composed.
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