发明名称 THIN-FILM CRYSTAL WAFER HAVING P-N JUNCTION, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce initial fluctuation rate of a collector current in an HBT, where carbon is introduced to a base layer for increasing the concentration of carriers. SOLUTION: Dehydrogenation annealing treatment is conducted on the base layer, where carbon is introduced as a dopant at an annealing temperature of 550 to 700 deg.C, and the concentration of a hydrogen atom is set at 5×1018 cm-3 or lower.
申请公布号 JP2002093818(A) 申请公布日期 2002.03.29
申请号 JP20000284471 申请日期 2000.09.20
申请人 SUMITOMO CHEM CO LTD 发明人 YAMADA HISASHI;FUKUHARA NOBORU;HATA MASAHIKO
分类号 H01L29/73;H01L21/324;H01L21/331;H01L29/205;(IPC1-7):H01L21/331 主分类号 H01L29/73
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