发明名称 HETEROJUNCTION FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To improve a saturation current characteristics, related to a heterojunction field effect transistors, by suppressing running of a carrier in a parasitic channel. SOLUTION: The heterojunction field effect transistor comprises a semiconductor substrate 1, a buffer layer 2, a channel layer 5 comprising a semiconductor material having a band gap smaller than that of the buffer layer 2 (SiGe, SiGeC and the like), a cap layer 4 comprising a semiconductor marital having a band gap larger than that of the channel layer 5, a gate insulating film 5, a gate electrode 6, and source/drain regions 10 and 11. A carrier-injection preventing insulating part 9 is provided for electrically insulating at least the upper part of the cap layer 4 from the source/drain, so that injection of carriers into the parasitic channel is suppressed, while the carrier is preferably injected into the channel layer.
申请公布号 JP2002094048(A) 申请公布日期 2002.03.29
申请号 JP20000274867 申请日期 2000.09.11
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 INOUE AKIRA;HARA YOSHIHIRO;TAKAGI TAKESHI;KUBO MINORU
分类号 H01L29/161;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/161
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