| 摘要 |
PROBLEM TO BE SOLVED: To improve the inspection accuracy of a pattern formed on a substrate. SOLUTION: This apparatus for inspecting external shape is used to measure the shape of a pattern 3 formed on the surface of a substrate 1, compare/collate the shape and position of a measured pattern 20 with those of a specification pattern 21, and judge whether or not the formed pattern 3 is normal according to the obtained result. It is provided with distance measuring means 7 and 9 which measure a height data at every position of the surface of the substrate and store a measured data file 10, a basic judgment means 17 which binarizes the respective height data with an optimal initial threshold to obtain a measured data and compare/collate the measured pattern with the specification pattern to judge whether or not the measured pattern is normal, and a re-judgment means 18 which binarizes respective height data stored in the measured data file with a threshold obtained by a different method from the initial threshold if the measured pattern is not normal, obtains a measured pattern, and compares/collates the measured pattern with the specification pattern again to judge whether or not the measured pattern is normal.
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