| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for generating an uniform and large polycrystalline silicon crystal particle by utilizing two amorphous silicon films and a crystal nucleus interposed in-between. SOLUTION: An improved method for crystallizing an amorphous silicon film in a polycrystalline silicon film, having a large crystal particle grain is disclosed. With the crystallization method, a first amorphous silicon film 6 is deposited on an oxide film 4, that is deposited for improving viscosity having a glass substrate 2 and for preventing contamination by approximately 10-300Å, and then a silane (SiH4) or disilane (Si2H6) gas is allowed to flow to form a silicon crystal nucleus 8 on the first amorphous silicon film 6. A second amorphous silicon 10 is re-deposited on the first amorphous silicon film, containing the crystal nucleus. An excimer laser 12 is applied to the amorphous silicon that is formed doubly for crystallization.
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