发明名称 SEMICONDUCTOR MEMORY AND SEMICONDUCTOR MEMORY MANUFACTURING MASK
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor memory which holds high speed random access function by solving the problem of the ferroelectric capacitor size becoming large and the distance between this capacitor and the inter-contact distance being large resulting in the growth of a dead space for inter-contacts to be large in cell size, thereby reducing the memory cell size to allow the chip area to be reduced and facilitate the manufacture, without reducing design rules. SOLUTION: The semiconductor memory has a TC parallel unit series connected ferroelectric memory having upper electrodes TE of ferroelectric capacitors and first contacts cAA-M1 and cTE-M1 for connecting the upper electrodes TE to source or drain terminals of cell transistors. The first contact is formed at a position which includes a point equidistant from adjacent four upper electrodes TE in its region.</p>
申请公布号 JP2002094017(A) 申请公布日期 2002.03.29
申请号 JP20000277822 申请日期 2000.09.13
申请人 TOSHIBA CORP 发明人 TAKASHIMA DAIZABURO
分类号 G11C14/00;H01L21/8246;H01L27/10;H01L27/105;H01L27/115;(IPC1-7):H01L27/105;G11C11/22 主分类号 G11C14/00
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