| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam aligner in which a high accuracy of pattern describing position is realized by minimizing lowering of throughput. SOLUTION: The electron beam aligner comprises means 11 for making a decision whether a positional shift is generated or not between a target pattern position and an actual writing position on a writing substrate 14 between start and end of multiplex writing, and means 12 for performing a corrective operation of the writing position during remaining multiplex writing such that the positional shift is cancelled.
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