发明名称 Undewater laser processing apparatus and underwater laser processing method
摘要 An underwater laser processing apparatus includes an optical unit and a nozzle. The optical unit irradiates a condensed laser beam generated by a YAG laser oscillator to a certain point on a underwater workpiece. The nozzle has a gas exit for supplying a gas to the certain point. In the nozzle, an area surrounding the gas exit extends to the surface of the workpiece. This area keeps the supplied gas between the nozzle and the workpiece to improve the underwater laser process.
申请公布号 US2002036190(A1) 申请公布日期 2002.03.28
申请号 US20010965122 申请日期 2001.09.28
申请人 TAMURA MASATAKA;KIMURA SEIICHIRO;MOTORA YUUICHI;TAKAHASHI HIDENORI 发明人 TAMURA MASATAKA;KIMURA SEIICHIRO;MOTORA YUUICHI;TAKAHASHI HIDENORI
分类号 G21C19/02;B23K26/02;B23K26/03;B23K26/06;B23K26/08;B23K26/12;B23K26/14;(IPC1-7):B23K26/24 主分类号 G21C19/02
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