摘要 |
A metal chelating composition having the formula: wherein Q is a carrier; S<1> is a spacer; L is -A-T-CH(X)- or -C(=O)-; A is an ether, thioether, selenoether, or amide linkage; T is a bond or substituted or unsubstituted alkyl or alkenyl; X is -(CH2)kCH3, -(CH2)kCOOH,-(CH2)kSO3H, -(CH2)kPO3H2, -(CH2)kN(J)2, or -(CH2)kP(J)2, preferably -(CH2)kCOOH or -(CH2)kSO3H; k is an integer from 0 to 2; J is hydrocarbyl or substituted hydrocarbyl; Y is -COOH, -H, -SO3H, -PO3H2, -N(J)2, or -P(J)2, preferably, -COOH; Z is -COOH, -H, -SO3H, -PO3H2, -N(J)2, or -P(J)2, preferably, -COOH; and i is an integer from 0 to 4, preferably 1 or 2. |
申请人 |
SIGMA-ALDRICH CO. |
发明人 |
KAPPEL, WILLIAM, K.;VISWANATHA, VENKATAPPA;LI, HANDONG;MEHIGH, RICHARD, J.;DAPRON, JOHN, G. |