发明名称 METAL CHELATING COMPOSITIONS
摘要 A metal chelating composition having the formula: wherein Q is a carrier; S<1> is a spacer; L is -A-T-CH(X)- or -C(&equals;O)-; A is an ether, thioether, selenoether, or amide linkage; T is a bond or substituted or unsubstituted alkyl or alkenyl; X is -(CH2)kCH3, -(CH2)kCOOH,-(CH2)kSO3H, -(CH2)kPO3H2, -(CH2)kN(J)2, or -(CH2)kP(J)2, preferably -(CH2)kCOOH or -(CH2)kSO3H; k is an integer from 0 to 2; J is hydrocarbyl or substituted hydrocarbyl; Y is -COOH, -H, -SO3H, -PO3H2, -N(J)2, or -P(J)2, preferably, -COOH; Z is -COOH, -H, -SO3H, -PO3H2, -N(J)2, or -P(J)2, preferably, -COOH; and i is an integer from 0 to 4, preferably 1 or 2.
申请公布号 WO0181365(A3) 申请公布日期 2002.03.28
申请号 WO2001US11529 申请日期 2001.04.10
申请人 SIGMA-ALDRICH CO. 发明人 KAPPEL, WILLIAM, K.;VISWANATHA, VENKATAPPA;LI, HANDONG;MEHIGH, RICHARD, J.;DAPRON, JOHN, G.
分类号 B01J20/281;B01D15/08;B01J45/00;C07C233/45;C07C303/22;C07C309/18;C07C319/20;C07C323/58;C07F15/04;C07K1/32;G01N30/88 主分类号 B01J20/281
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