发明名称 |
Coating substrate surface with metal or alloy using electrolyte solution, e.g. for galvanizing wafer, involves applying stabilizer to substrate surface to maintain metal or alloy in electrolyte solution |
摘要 |
Process for coating a surface of a substrate with a metal or an alloy using an electrolyte solution comprises applying a stabilizing agent on the substrate surface to maintain the metal or metal alloy in the electrolyte solution. An Independent claim is also included for an electrolyte solution used in the process comprising 0.5-1.0 mol/kg citrate, 0.5 mol/kg acetate, 0.2-0.5 mol/kg EDTA and 0.1-1.0 mol/kg ammonia. Preferred Features: The stabilizing agent is directly applied to the wet wafer surface using an electrochemical or currentless coating process.
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申请公布号 |
DE10134961(A1) |
申请公布日期 |
2002.03.28 |
申请号 |
DE2001134961 |
申请日期 |
2001.07.18 |
申请人 |
IBM INTERNATIONAL BUSINESS MACHINES CORP., ARMONK |
发明人 |
BARBER, PETER HEINRICH;DIEL, WOLFGANG;KRITZER, PETER |
分类号 |
C23C18/16;C25D5/48;H01L21/288;(IPC1-7):C25D5/48;C23C18/00;H01L21/320 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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