发明名称 Coating substrate surface with metal or alloy using electrolyte solution, e.g. for galvanizing wafer, involves applying stabilizer to substrate surface to maintain metal or alloy in electrolyte solution
摘要 Process for coating a surface of a substrate with a metal or an alloy using an electrolyte solution comprises applying a stabilizing agent on the substrate surface to maintain the metal or metal alloy in the electrolyte solution. An Independent claim is also included for an electrolyte solution used in the process comprising 0.5-1.0 mol/kg citrate, 0.5 mol/kg acetate, 0.2-0.5 mol/kg EDTA and 0.1-1.0 mol/kg ammonia. Preferred Features: The stabilizing agent is directly applied to the wet wafer surface using an electrochemical or currentless coating process.
申请公布号 DE10134961(A1) 申请公布日期 2002.03.28
申请号 DE2001134961 申请日期 2001.07.18
申请人 IBM INTERNATIONAL BUSINESS MACHINES CORP., ARMONK 发明人 BARBER, PETER HEINRICH;DIEL, WOLFGANG;KRITZER, PETER
分类号 C23C18/16;C25D5/48;H01L21/288;(IPC1-7):C25D5/48;C23C18/00;H01L21/320 主分类号 C23C18/16
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