发明名称 CMOS image sensor and manufacturing method for the same
摘要 The invention provides a CMOS image sensor that can decrease the influence of the noise charge on the OB cells that determine the darkness level and can prevent the deterioration of the image quality. A region that absorbs the noise charge in a substrate is formed at the periphery of the cell array portion. As in the photodiode, a PN junction is formed in the noise charge absorption region, and one end thereof is connected to a power source voltage. This noise charge absorption region is formed between the cell array portion and the peripheral circuit portion.
申请公布号 US2002036303(A1) 申请公布日期 2002.03.28
申请号 US20010962115 申请日期 2001.09.26
申请人 OHKUBO HIROAKI 发明人 OHKUBO HIROAKI
分类号 H01L27/146;H01L31/10;H04N5/335;H04N5/357;H04N5/369;H04N5/374;(IPC1-7):H01L27/148 主分类号 H01L27/146
代理机构 代理人
主权项
地址