发明名称 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
摘要 |
A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength lambd1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength lambd1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
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申请公布号 |
US2002037461(A1) |
申请公布日期 |
2002.03.28 |
申请号 |
US20010934681 |
申请日期 |
2001.08.23 |
申请人 |
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发明人 |
VAN DER WERF JAN E.;KROON MARK;KEUR WILHELMUS C.;BANINE VADIM Y.;VAN DER LAAN HANS;MOORS JOHANNES H.J.;LOOPSTRA ERIK R. |
分类号 |
G21K5/00;G01T1/20;G01T1/28;G03F7/20;G21K5/02;H01L21/027;(IPC1-7):G03C5/00;A61N5/00;G21G5/00 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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