发明名称 VERY SMALL CHEMICAL DEVICE AND FLOW RATE ADJUSTING METHOD THEREFOR
摘要 <p>A very small chemical device with a valve function, having high pressure-resistance and a flow channel cross-sectional area independent of liquid pressure, capable of suppressing adsorption of living body components, and easy to manufacture; and a flow rate adjusting method therefor. A member (A) having a groove in its surface has another member (B) bonded to the grooved surface thereof, and the groove of the member (A) cooperates with the member (B) to define a capillary flow channel having a width of 1-1000 µm and a height of 1-1000 µm on the bond surface between the members (A, B), the flow channel having a gap somewhere therein, the width of the gap being 0.5 100 times that of the capillary flow channel, the maximum height/maximum width ratio of the gap being 1 or less, either the member (A) or the member (B) being made of a soft material having a Young's modulus of from 0.1 Mpa to less than 700 Mpa at least in the portion opposed to the gap, the valve function being such that selectively pressing the gap from the outside of the member (A) and/or the member (B) allows the volume of the gap to reversibly decrease.</p>
申请公布号 WO2002024320(P1) 申请公布日期 2002.03.28
申请号 JP2001001563 申请日期 2001.03.01
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