| 摘要 |
<p>To decrease the number of irradiations of an object portion to be inspected with an electron beam, a stage (14) is moved under an optical microscope (12). The object portion is shot by means of the optical microscope, and the image is processed to determine the position (Xt0, Yt0, Zt0) of the object portion. The position (XS0, YS0, ZS0) of a reference point of a reference member (53) is similarly determined. The stage is moved to an electron beam irradiation position and controlled so that the electron beam may be focused onto the reference member. An SEM image of the reference point portion is formed and the image is processed to determine the position (XSB, YSB, ZSB). The stage is moved to the position (X, Y, Z) where X=Xt0+(XSB-XS0), Y=Yt0+(YSB-SS0), Z=Zt0+(ZSB-ZS0), and the object portion (25) is irradiated with the electron beam to inspect it.</p> |
