| 摘要 |
<p>A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material (12) that has a surface (14) with an adjacent gas phase. A chamber (16) is positioned in close proximity to a surface (14) of the material (12). The position of the chamber (16) creates a relatively small gap (H) between the surface of the material (14) and the chamber (16). The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap (H) limits the flow of mass that is external to the chamber (16) from being swept through the chamber by induced flow.</p> |
