发明名称 Spiral inductor and method for fabricating semiconductor integrated circuit device having same
摘要 A spiral inductor comprising: a substrate; a protruding portion which is formed on the top face of the substrate and the top of which serves as a dummy element for controlling a chemical mechanical polishing process; and a conductive layer which is formed on the substrate so as to have a spiral shape and which serves as an induction element, wherein the protruding portion is formed in a region other than a region directly below the conductive layer.
申请公布号 US2002036335(A1) 申请公布日期 2002.03.28
申请号 US20010960333 申请日期 2001.09.24
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MINAMI YOSHIHIRO
分类号 H01L21/822;H01F17/00;H01F41/04;H01L21/02;H01L27/04;H01L27/08;(IPC1-7):H01L21/76;H01L29/00 主分类号 H01L21/822
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