发明名称 ELECTROLYTE AND METHOD FOR DEPOSITING TIN-COPPER ALLOY LAYERS
摘要 The invention relates to an acid electrolyte for depositing tin-copper alloys. Said electrolyte comprises one or more alkylsulfonic acids and/or alkanolsulfonic acids, one or more soluble tin(II) salts, one or more soluble copper(II) salts, and one or more organic sulfur compounds having one or more thioether functions and/or ether functions of general formula -R-Z-R'- (R and R' are the same or different non-aromatic organic radicals, and Z represents S or O). The invention also relates to a method, which involves the use of the electrolyte, to the coating obtained using said method, and to the use of the electrolyte for coating electronic components.
申请公布号 WO0224979(A1) 申请公布日期 2002.03.28
申请号 WO2001EP10907 申请日期 2001.09.20
申请人 DR.-ING. MAX SCHLOETTER GMBH & CO. KG;DIETTERLE, MICHAEL;JORDAN, MANFRED;STRUBE, GERNOT 发明人 DIETTERLE, MICHAEL;JORDAN, MANFRED;STRUBE, GERNOT
分类号 C25D3/58;C25D3/60;H05K3/24 主分类号 C25D3/58
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