发明名称 |
METHOD FOR PRODUCING ADHESIVE FILM FOR SEMICONDUCTOR AND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an adhesive film for semiconductors by a ready process and a semiconductor device using this method. SOLUTION: This method for producing an adhesive film for semiconductors comprises (1) a step for preparing a monolayer adhesive film by forming a layer of a thermoplastic adhesive agent having 0.1-10 MPa storage elastic modulus at 180 deg.C and -80 to 50 deg.C peak temperature of loss modulus on a substrate and (2) a step for superposing an adhesive layer surfaces of the above adhesive film to both sides of a heat-resistant film and pressing the adhesive layer surfaces at a temperature higher by 50-200 deg.C than the peak temperature of loss modulus of the thermoplastic adhesive agent. This semiconductor device is obtained by using the above film.
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申请公布号 |
JP2002088325(A) |
申请公布日期 |
2002.03.27 |
申请号 |
JP20000284553 |
申请日期 |
2000.09.20 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
NAGOYA TOMOHIRO;MATSUURA SHUICHI;KAWAI AKIYASU |
分类号 |
C09J7/02;C09J179/08;H01L21/52;(IPC1-7):C09J7/02 |
主分类号 |
C09J7/02 |
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