发明名称 METHOD FOR PRODUCING ADHESIVE FILM FOR SEMICONDUCTOR AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing an adhesive film for semiconductors by a ready process and a semiconductor device using this method. SOLUTION: This method for producing an adhesive film for semiconductors comprises (1) a step for preparing a monolayer adhesive film by forming a layer of a thermoplastic adhesive agent having 0.1-10 MPa storage elastic modulus at 180 deg.C and -80 to 50 deg.C peak temperature of loss modulus on a substrate and (2) a step for superposing an adhesive layer surfaces of the above adhesive film to both sides of a heat-resistant film and pressing the adhesive layer surfaces at a temperature higher by 50-200 deg.C than the peak temperature of loss modulus of the thermoplastic adhesive agent. This semiconductor device is obtained by using the above film.
申请公布号 JP2002088325(A) 申请公布日期 2002.03.27
申请号 JP20000284553 申请日期 2000.09.20
申请人 HITACHI CHEM CO LTD 发明人 NAGOYA TOMOHIRO;MATSUURA SHUICHI;KAWAI AKIYASU
分类号 C09J7/02;C09J179/08;H01L21/52;(IPC1-7):C09J7/02 主分类号 C09J7/02
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