发明名称 METHOD AND SYSTEM FOR DEPOSITING TRANSPARENT ELECRICALLY CONDUCTIVE FILM
摘要 <p>PROBLEM TO BE SOLVED: To inexpensively deposit a transparent electrically conductive film with high precision. SOLUTION: A base material face 2a as the object for depositing a transparent electrically conductive film 1 is subjected to patterning by a mask material 3a having a subliming condition higher than the film deposition condition of a transparent electrically conductive film material 1a to form a mask, thereafter, the surface of the material face 2a as the object is fed with the transparent electrically conductive film material 1a, and the film deposition treatment of the transparent electrically conductive film material 1a under the above condition and the subliming treatment of the mask 3 under the above condition are performed and are completed one by one to sublime away the mask 3, and only leaving the transparent electrically conductive film 1 patterned by the mask 3, the transparent electrically conductive film 1 with a prescribed pattern is formed to achieve the purpose.</p>
申请公布号 JP2002088476(A) 申请公布日期 2002.03.27
申请号 JP20000279307 申请日期 2000.09.14
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 SOTOZONO NOBUTAKA;NISHIKAWA KAZUHIRO;TSUTSUI YUJI
分类号 C23C16/40;C23C16/04;H01J9/02;H01J11/22;H01J11/34;H01L31/04;(IPC1-7):C23C16/40;H01J11/02 主分类号 C23C16/40
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