发明名称 |
Radioactive medical implant and method of manufacturing |
摘要 |
<p>A medical implant for use in brachytherapy or other medical treatment preferably having a silicon base and radioactive ions implanted in it. Preferably radioactive xenon ions are used. An ion implantation process is provided for doping the silicon substrate with the radioactive ions in a controlled fashion. <IMAGE></p> |
申请公布号 |
EP1191121(A1) |
申请公布日期 |
2002.03.27 |
申请号 |
EP20000308414 |
申请日期 |
2000.09.26 |
申请人 |
VARIAN MEDICAL SYSTEMS, INC. |
发明人 |
DELFINO, MICHELANGELO |
分类号 |
G21G4/08;A61M36/04;A61N5/10;C23C14/48;G21K5/04;H05H1/24;(IPC1-7):C23C14/48 |
主分类号 |
G21G4/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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