发明名称 Radioactive medical implant and method of manufacturing
摘要 <p>A medical implant for use in brachytherapy or other medical treatment preferably having a silicon base and radioactive ions implanted in it. Preferably radioactive xenon ions are used. An ion implantation process is provided for doping the silicon substrate with the radioactive ions in a controlled fashion. &lt;IMAGE&gt;</p>
申请公布号 EP1191121(A1) 申请公布日期 2002.03.27
申请号 EP20000308414 申请日期 2000.09.26
申请人 VARIAN MEDICAL SYSTEMS, INC. 发明人 DELFINO, MICHELANGELO
分类号 G21G4/08;A61M36/04;A61N5/10;C23C14/48;G21K5/04;H05H1/24;(IPC1-7):C23C14/48 主分类号 G21G4/08
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