| 摘要 |
PROBLEM TO BE SOLVED: To obtain a material capable of being developed in a short time when used for a positive type photosensitive resin composition and developing high sensitive and high contrast patterning properties. SOLUTION: This imidophenol compound is expressed by the following general formula (1) or (2) [wherein X expresses a group selected from formulae (3)-(10) or a single bond; Y expresses a divalent organic group]. |
