| 摘要 |
PROBLEM TO BE SOLVED: To satisfactorily perform the close contact between a glass mask and a substrate without making the whole of a device large-sized. SOLUTION: In this contact aligner, the glass mask M fixed on an upper frame 20 and a photosensitive agent layer R of the surface of the substrate B which is mounted and fixed on a supporting base 10 are brought into close contact with each other by suction force. Therein, a mechanism 15 which pushes the substrate B from the lower surface is disposed on the supporting base 10, the substrate B is made projected by the mechanism and the photosensitive agent layer R of the substrate B and the glass mask M are brought into close contact from the central part of surface. By bringing the glass mask and the substrate closely into contact with each other, a close contact all over the whole surface can be obtained without generating the remainder of air. In addition, an evacuating time is made to be shorter as compared with the conventional close contact method, the efficiency of operation is improved and the close contact all over the whole surface can be obtained even for a large-sized glass mask. Further, this contact exposure device has no mechanism pressing from above and, therefore, is not made to be large-sized.
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