发明名称 PARTS FOR VACUUM FILM DEPOSITION SYSTEM, VACUUM FILM DEPOSITION SYSTEM USING THE SAME, TARGET DEVICE, AND VACUUM FILM DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To stably and effectively prevent the peel-off of a film deposition material adhering to parts for vacuum film deposition system, a target, and a backing plate during a film deposition process, the peel-off of a sprayed deposit itself, and further the falling of particles from a deposit and also to suppress the increase in film deposition cost attendant on cleaning, or the like. SOLUTION: The parts for vacuum film deposition system have a base material for parts and a sprayed deposit formed on the surface of the base material for parts, and further, the sprayed deposit has a basic film composition A at a place adjacent to the surface part of the base material and a basic film composition B in the surface part of the sprayed deposit and also has a gradient composition at least in a part of a space between the basic film composition A and the basic film composition B. The vacuum film deposition system is constituted by applying the above parts for vacuum film deposition system to a film-deposition sample holding part, a film- deposition source holding part, deposition preventing parts, or the like. The target device is constituted by depositing a similar sprayed deposit onto the surface of a noneroded area of the target body and the surface of the backing plate body.
申请公布号 JP2002088464(A) 申请公布日期 2002.03.27
申请号 JP20000275888 申请日期 2000.09.12
申请人 TOSHIBA CORP 发明人 SATO MICHIO
分类号 C23C14/00;C23C4/00;C23C14/34;C23C16/44;H01L21/203;H01L21/205;(IPC1-7):C23C14/00 主分类号 C23C14/00
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