APPARATUS FOR CLEANING WAFER

摘要

PURPOSE: An apparatus for cleaning a wafer is provided to efficiently transfer megasonic energy towards the wafer and to clean the lower surface of the wafer, by filling medium liquid in a gap between the lower surface of the wafer and a megasonic launching unit. CONSTITUTION: A rotating unit(100) is mounted on a chamber(20). The wafer put into the chamber is mounted on a wafer mounting unit(300) installed inside the chamber. The wafer mounting unit is rotated by the rotating unit, connected to the rotating unit. A chemical liquid spraying unit(400) sprays chemical liquid on the upper surface of the wafer. A clean air spraying unit(500) sprays clean air on the upper surface of the wafer. The megasonic launching unit(600) oscillates megasonic towards the entire lower surface of the wafer from the lower portion of the wafer. A medium liquid supplying unit(700) exhausts a medium towards the lower surface of the wafer to transfer megasonic energy to the lower surface of the wafer through the medium liquid while a cleaning process and a rinsing process are performed, installed in the upper portion of the megasonic launching unit. An exhausting unit(800) exhausts liquid and gas after a cleaning process, installed in the chamber.