| 摘要 |
PROBLEM TO BE SOLVED: To make detectable defects in a fine pattern on a transparent layer insulating film and on the same layer with high sensitivity while detecting the defects of a lower layer pattern and the same pattern in the defocused state to detect only the defect of a process to be originally inspected. SOLUTION: This inspection device for an object to be inspected where a plurality of patterns to be originally the same pattern are regularly arranged, comprises an image pickup optical system provided with the relation between objective lens numerical aperture and illumination wavelength with resolution of 0.18μm or less, preferably 0.13μm or less; a photoelectric transducer disposed in the image focusing position of the image pickup optical system, an automatic focusing optical system comprising an optical path provided separately from the image pickup optical system and illuminating at the incident angle of 85 deg. or more, preferably 88 deg. or more, a means for adjusting the focal position of the image pickup optical system on the basis of a detection signal of the automatic focusing optical system, and a means for processing an electric signal of the photoelectric transducer.
|
