发明名称 SPUTTERING SYSTEM
摘要 PROBLEM TO BE SOLVED: To inexpensively provide a small-size sputtering system with which excellent film characteristics can be efficiently obtained at high speed in depositing a multilayered film. SOLUTION: A plurality of magnetron cathodes are provided to the outside periphery of a carousel 18 which supports, on its lateral sides, a plurality of base board holders 19 for holding the base boards to be subjected to film deposition and rotates them. These magnetron cathodes have polygonal-prism-shaped cathode holders 6a, 6b and 6c each using a point on the circumference of a circle centering around the rotation axis of the carousel 18 as the center axis of rotation. The cathodes are attached to the plurality of lateral sides of the cathode holders 6a, 6b and 6c, respectively. Targets 91a, 92a, 93a, 91b, 92b, 93b, 91c, 92c and 93c respectively composed of different materials are provided to the cathodes, respectively. Moreover, each of the cathode holders 6a, 6b and 6c has a target driving system 23 which rotates round its center axis and switches the target to be allowed to face the base board to be subjected to film deposition.
申请公布号 JP2002088470(A) 申请公布日期 2002.03.27
申请号 JP20000277970 申请日期 2000.09.13
申请人 CANON INC 发明人 ANDO KENJI;OTANI MINORU;SUZUKI YASUYUKI;HIROO RYUJI;KANAZAWA HIDEHIRO
分类号 G02B5/26;C23C14/34;G02B5/28;(IPC1-7):C23C14/34 主分类号 G02B5/26
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