POSITIVE TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type resist composition which ensures improved edge roughness of a pattern, solves the problem of development defects and gives excellent resist pattern profile. SOLUTION: The positive type resist composition contains (A) a resin having an alicyclic hydrocarbon group and having a velocity of dissolution in an alkali developing solution increased by the action of an acid, (B) a compound which generates an acid when irradiated with active light or radiation and (C) a nitrogen-containing compound having at least one specified nitrogen-containing partial structure in one molecule.