POSITIVE TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a superior positive type photoresist composition excellent in resolving power and developability and ensuring suppressed jumping of isolated patterns. SOLUTION: The positive type resist composition contains an alkali-soluble resin, a 1,2-quinonediazido compound and a high molecular compound having a fluoroaliphatic group derived from a specified fluoroaliphatic compound in a side chain.