发明名称 METHOD OF PRODUCING SINGLE CRYSTAL SILICON
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a single crystal silicon by which the high quality single crystal silicon, wherein the concentration of any one of silicon isotopes Si-28, Si-29 and Si-30 is higher than that in the natural silicon element, can be produced in large quantities. SOLUTION: The method of producing the single crystal silicon, wherein the concentration of the isotope Si-28 is higher than that of the isotope in the natural silicon element, comprises setting the concentration of the isotope Si-28 of the silicon element in a silicon melt 11 to be >=92.3% and setting the concentration of the isotope Si-28 of the silicon element in a seed crystal 13 to be >=92.3%. Further, when the single crystal is produced by a Czochralski method, quartz is used as a material for a crucible 12 for supporting the silicon melt 11 and the concentration of the isotope Si-28 of the silicon element in the quartz is also set to be >=92.3%.
申请公布号 JP2002087900(A) 申请公布日期 2002.03.27
申请号 JP20000273890 申请日期 2000.09.08
申请人 ITO ASSOCIATES:KK 发明人 ITO KOHEI
分类号 C30B29/06;H01L21/208;(IPC1-7):C30B29/06 主分类号 C30B29/06
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